Selected Topics in Group IV and II VI Semiconductors

Author: E.H.C. Parker
Publisher: Newnes
ISBN: 0444596437
Format: PDF, Mobi
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This book contains the proceedings of two symposia which brought together crystal growers, chemists and physicists from across the world. The first part is concerned with silicon molecular beam epitaxy and presents an overview of the most research being done in the field. Part two discusses the problems dealing with purification, doping and defects of II-VI materials, mainly of the important semiconductors CdTe and ZnSe. The focus is on materials science issues which are the key for a better understanding of these materials and for any industrial application.

Magnetic Ultra Thin Films Multilayers and Surfaces

Author: M. A. M. Gijs
Publisher: Elsevier
ISBN: 9780444205032
Format: PDF
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The Symposium on Magnetic Ultrathin Films, Multilayers and Surfaces, hosted by the European Materials Research Society, was held at the Palais de la Musique et des Congr� in Strasbourg, France on June 4-7, 1996. Its central theme was the relationship of magnetic properties and device performance to structure at the nano and micrometer length scale. Research on the magnetism of surfaces, ultrathin films and multilayers has increased dramatically during recent years. This development was triggered by the discovery of coupling between ferromagnetic layers across nonmagnetic spacer layers and of the giant magnetoresistance effect in systems of reduced dimension using various micro and nanofabrication techniques has become a subject of special interest. It is certainly the promising application potential of these effects in new magnetic recording device geometries which causes this intensive research, which is done both by companies and at universities and research institutes. A selection of invited and contributed papers presented at the Symposium and accepted for publication is contained in this volume. The contents of these proceedings are organized into seven sections. A. Nanowires, Nanoparticles, Nanostructuring B. Ultrathin Films and Surfaces, Characterization C. Giant Magnetoresistance D. Coupling, Tunneling E. Growth, Structure, Magnetism F. Growth, Structure, Magnetoresistance G. Coupling, Magnetic processes, Magneto-optics. The first four sections contain invited and oral contributed papers in the listed research domains, while the last three sections contain the contributions presented during three large poster sessions.

Porous Silicon Material Technology and Devices

Author: H. Münder
Publisher: Newnes
ISBN: 0444596348
Format: PDF, Mobi
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These proceedings represent the most recent progress in the field of porous silicon. Several papers present results in which the influence of the formation parameters on the structural and optical properties has been investigated. Further topics dealt with include: the influence of light during the formation process on the photoluminescence behaviour; fundamental mechanism of the photoluminescence; the electroluminescence of porous silicon; applications based on porous silicon; charge carrier transport.

C H N and O in Si and Characterization and Simulation of Materials and Processes

Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Format: PDF, ePub, Mobi
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Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.

Laser Ablation

Author: E. Fogarassy
Publisher: Newnes
ISBN: 0444596321
Format: PDF, Docs
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This book contains the proceedings of the largest conference ever held on this subject. The strong interest in this field is largely due to the fact that both fundamental aspects of laser-surface interaction as well as applied techniques for thin film generation and patterning were treated in detail by experts from around the world.

High Energy and High Dose Ion Implantation

Author: S.U. Campisano
Publisher: Elsevier
ISBN: 0444596798
Format: PDF, ePub
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Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.

Magnetic Thin Films Multilayers and Superlattices

Author: A. Fert
Publisher: Elsevier
ISBN: 0444596690
Format: PDF, Mobi
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Materials Research in thin and ultrathin magnetic structures is a multidisciplinary field which heavily relies on state-of-the-art growth, characterization and theoretical approaches to build a comprehensive physical picture on how magnetic properties depend on interfacial structural issues, interlayer coupling and transport phenomena. Often in this field, the critical properties and characterization required necessitates knowledge of structural and magnetic phenomena extending over several atomic planes. Atomic controlled growth techniques are required and atomic sensitivity is needed from magnetic and structural probes. This critical knowledge is vital for device applications, providing the basis for the synergistic interactions that are predominant in this field of research. This volume is the definitive reference source for anyone interested in the latest advances and results of current experimental research in ultrathin film magnetism.

Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

Author: P.L.F. Hemment
Publisher: Newnes
ISBN: 0444596313
Format: PDF
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Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation. Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

Neutron Transmutation Doping of Semiconductor Materials

Author: Robert D. Larrabee
Publisher: Springer Science & Business Media
ISBN: 1461326958
Format: PDF, ePub, Mobi
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viii The growing use of NTD silicon outside the U. S. A. motivated an interest in having the next NTD conference in Europe. Therefore, the Third International Conference on Neutron Transmutation-Doped Silicon was organized by Jens Guldberg and held in Copenhagen, Denmark on August 27-29, 1980. The papers presented at this conference reviewed the developments which occurred during the t'A'O years since the previous conference and included papers on irradiation technology, radiation-induced defects, characteriza tion of NTD silicon, and the use of NTD silicon for device appli cations. The proceedings of this conference were edited by Jens Guldberg and published by Plenum Press in 1981. Interest in, and commercial use of, NTD silicon continued to grow after the Third NTD Conference, and research into neutron trans mutation doping of nonsilicon semiconductors had begun to accel erate. The Fourth International Transmutation Doping Conference reported in this volume includes invited papers summarizing the present and anticipated future of NTD silicon, the processing and characterization of NTD silicon, and the use of NTD silicon in semiconductor power devices. In addition, four papers were pre sented on NTD of nonsilicon semiconductors, five papers on irra diation technology, three papers on practical utilization of NTD silicon, four papers on the characterization of NTD silicon, and five papers on neutron damage and annealing. These papers indi cate that irradiation technology for NTD silicon and its use by the power-device industry are approaching maturity.

Electrical and Related Properties of Organic Solids

Author: R.W. Munn
Publisher: Springer Science & Business Media
ISBN: 9401157901
Format: PDF, ePub, Mobi
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Organic solids exhibit a wide range of electrical and related properties. They occur as crystals, glasses, polymers and thin films; they may be insulators, semiconductors, conductors or superconductors; and they may show luminescence, nonlinear optical response, and complex dynamical behaviour. The book provides a broad survey of this area, written by international experts, one third being drawn from Eastern Europe. Electrical, optical, spectroscopic and structural aspects are all treated in a way that gives an excellent introduction to current themes in this highly interdisciplinary and practically important area. The coverage is especially strong in the areas where electrical and optical properties overlap, such as photoconductivity, electroluminescence, electroabsorption, electro-optics and photorefraction.